Co-Deposition of PbS–CuS Thin Films by Chemical Bath Technique

Abstract

Chemical bath deposition of thin film PbS–CuS from solution containing Pb2+and Cu2+and thiourea is presented. X-ray fluorescence analyses show the relative abundance of Pb, Cu, and S in the films as a function of the duration of deposition. These results along with those obtained from X-ray diffraction analyses support the formation of thin film of the type (PbS)1−x(CuS)x. An important feature of these films is their good adhesion to glass substrate even at long durations of deposition (24 h); a characteristic basic to chemically deposited PbS thin films. The near infrared optical transmittance (70%) as well as the p-type sheet resistance (1 MΩ) of the as prepared films drop considerably to typically 15% and 300Ω when annealed at 200°C in air or nitrogen ambient, both being basic behaviors of chemically deposited CuS thin films.