Abstract

To date, several photonic applications have been demonstrated without considerable thermal management efforts. However, in phase-sensitive photonic applications, thermal management becomes of utmost importance. Thermal management of photonic systems requires not only efficient heat dissipation, but also reduction of on-chip temperature gradients. Particularly in highly integrated systems, in which several components are integrated within a single photonic integrated circuit, the reduction of on-chip temperature gradients is necessary to guarantee the correct functionality of the system. Due to their high integration density as well as their extreme temperature sensitivity, optical phased arrays are ideal examples of a system, where thermal management is required. Ideally, thermal management solutions of such systems should not require additional power for operation. Therefore, it is desired to improve the heat dissipation and to reduce temperature gradients by structural modifications of the photonic circuit. Furthermore, to cope with the advantages of silicon photonics, thermal management solutions must be compatible with series fabrication processes. In this work, complementary metal–oxide–semiconductor (CMOS)-compatible measures for thermal management of silicon photonic integrated circuits are proposed and validated by characterization of in-house fabricated thermal demonstrators. The proposed concepts are extremely efficient not only in reducing temperature gradients, but also in improving the heat dissipation from integrated heat sources.

Highlights

  • With the advent of optical technologies, optical beam steering has gained a lot of attention

  • Due to the missing physical contact between both regions, electrical interconnection is limited to the use of electrical wire-bonds. Initially this could appear equivalent to using independent chips, integrating lasers and Application-Specific Integrated Circuits (ASICs) on the Photonic Integrated Circuits (PIC) substrate increases the integration density and reduces mechanical stability issues, those associated with the precise alignment required between the laser and the in-coupling waveguide of the photonic IC

  • Two complementary metal–oxide–semiconductor (CMOS)-compatible concepts for thermal management of silicon photonic circuits were presented and their efficiency was experimentally validated by in-house fabrication and electrothermal characterization of thermal demonstrators

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Summary

Introduction

With the advent of optical technologies, optical beam steering has gained a lot of attention. Silicon photonic optical phased arrays (OPAs) are promising candidates for future solid-state beam steering systems [11,12,13]. To allow for large-scale fabrication, the structural modification should be compatible with the CMOS processes used for fabrication of the PIC To this end, other groups have shown the use of so-called air trenches to improve the heating efficiency of thermo-optic modulators, and to reduce the cross-talk between neighboring modulators [29]. Two CMOS-compatible measures for thermal management of silicon photonic circuits are proposed The efficiency of both concepts is determined experimentally by electrothermal characterization of in-house fabricated thermal demonstrators.

Conceptual Description of Proposed Measures
Trenches for Reduction of Temperature Gradients
Heat Shunts for Improvement of the Heat Dissipation
Methods for Fabrication and Characterization of Thermal Demonstrators
Fabrication Methods
Fabrication of Trenched Demonstrators
Fabrication of Heat Shunts
Electrothermal Characterization Methods
Experimental Evaluation of Proposed Measures
Reference Demonstrators—Influence of the Heating Power
On Silicon Trenches for Reduction of Temperature Gradients
Heat Shunts as Thermal Bridges for Improvement of Heat Dissipation
Findings
Conclusions
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