CMOS Compatible High‐Performance Nanolasing Based on Perovskite–SiN Hybrid Integration

Abstract

AbstractCoherent light sources in silicon photonics are the long‐sought Holy Grail because silicon‐based materials have indirect bandgap. Traditional strategies for realizing such sources, e.g., heterogeneous photonic integration, strain engineering, and nonlinear process, are technologically demanding. Here, a hybrid lasing device composed of perovskite nanocrystals and silicon nitride nanobeam cavity is demonstrated. SiN photonic crystal naonobeam cavities are fabricated on a solid substrate with significantly improved thermal and mechanical stabilities compared to conventional suspended ones. In addition, adding a poly (methyl methacrylate) (PMMA)‐encapsulation layer on top of the SiN can significantly boost the Q‐factor of the cavity mode. By dispersing perovskite nanocrystals as emitters in the PMMA layer, high‐performance coherent emissions are obtained in terms of lasing threshold, linewidth, and mode volumes. The work offers a compelling way of creating solution‐processed active integrated photonic devices based on the mature platform of silicon photonics for applications in optical information science and photonic quantum technology.