Abstract
We report a simple and low-cost fabrication of antireflection subwavelength grating (SWG) structures on GaAs using the lenslike shape transfer by a holographic lithography and a reflowed photoresist mask. The use of an additional thermal reflow process enhances the close packing of two-dimensional SWGs with a conical shape. The aspect ratio of conical SWG was also controlled easily by adjusting the rf power during the dry etch process. The fabricated SWGs exhibited low reflection properties over a wide spectral range, in agreement with the calculated values using by a rigorous coupled-wave analysis simulation.
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