Cleaning results of new and fouled nanofiltration membrane characterized by contact angle, updated DSPM, flux and salts rejection

Abstract

In membrane process industries, membrane cleaning is one of the most important concerns from both economical and scientific points of view. Though cleaning is important to recover membrane performance, an inappropriate selection of cleaning agents may result into unsatisfactory cleaning or irreparable membrane. In this study the cleaning performance has been studied with measurements of membrane contact angle, Updated Donnan steric partitioning pore model (UDSPM) and salt rejection as well as flux measurement. Thin film nanofiltration (NF) membranes such as DK, HL and DL provided by GE Osmonics are used in this study. Tests were carried out with virgin DK, HL and DL as well as fouled DK membranes. Several cleaning agents were investigated; some of them were analytical grade such as HCl, NaOH and others such as SDS, mix agents were commercial grade agents that are already in use in commercial plants. Contact angle, DSPM and salt rejection as well as flux of virgin and fouled membranes before and after chemical cleaning were measured and compared. The contact angle measurements with and without chemical cleaning of different virgin and fouled membranes revealed very interesting results which may be used to characterise the membrane surface cleanliness. The contact angle results revealed that the cleaning agents are found to modify membrane surface properties (hydrophobicity/hydrophilicity) of the treated and untreated virgin and fouled membranes. The details of these results were also investigated and are reported in the paper. However, UDSPM method did not give any valuable information about pore size of the untreated and treated NF membranes. The salt rejection level of monovalent and divalent ions before and after cleaning by high and low pH cleaning agents is also investigated and is reported in the paper.