Abstract
In this work, the etching characteristics of <TEX>$Ge_2Sb_2Te_5(GST)$</TEX> thin films were investigated using an inductively coupled plasma (ICP) of <TEX>$Cl_2/Ar$</TEX> gas mixture. To analyze the etching mechanism, an optical emission spectroscopy (OES) and surface analysis using X-ray photoelectron spectroscopy (XPS) were carried out. The etch rate of the GST films decreased with decreasing Ar fraction. At the same time, high selective etch rate over <TEX>$SiO_2$</TEX> films was obtained and the selectivity over photoresist films decreased with increasing the he fraction. From XPS results, we found that Te halides were formed at the etching surface and Te halides limited the etch rate of the GST films.
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