Abstract
The chromium silicide-based electroconductive composites were fabricated by solid-state sintering of chromium silicide and chromium oxide powders at 1370 °C in argon. The final densified composites were composed of various solid solution and silicide phases (e.g. Cr3Si, Cr5Si3) and silica, depending on the starting silicide/oxide volume ratio ranging from 0.67 to 9.0. Major phases were found to be homogeneously distributed within the metastable (cristobalite) and/or amorphous silica grain boundary phase. The controlled oxidation experiments revealed excellent oxidation resistance at 50°-870 °C, where low-level oxidation was observed. The composites all displayed a metallic-type electrical conductivity due to the presence of the Cr3Si, Cr5Si3 and CrSi as the major conductive silicide phases. Their electrical conductivities ranged from 42.1 to 213.7 S/cm at 1000 °C. High-temperature annealing of the composites resulted in phase and microstructural changes, which further improved their high-temperature oxidation resistance and electrical transport properties.
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