Abstract
Previous works have shown the benefits of depositing ultrathin films (0.5-3.0 nm) of chromium onto SEM specimens to permit improved resolution at higher magnification. The finer grain structure of the chromium permits closer replication of the specimen surface topography than is possible with the conventional 10 nm of gold. This paper presents the results of an ongoing program at Denton Vacuum to develop guidelines for successful, repeatable deposition of ultrathin chromium films by sputtering.Chromium can be deposited using a high vacuum evaporator by either evaporation of chips from baskets or sputtering. Sputtering is the more desirable method since it has the potential for better rate control, coverage, repeatability and least specimen exposure to radiant heat.
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