Abstract
Light dependent (35 Klux) chlorophyll bleaching in autotrophically grown Euglena gracilis cells at slightly acidic pH (6.5-5.4) is stimulated by the photosystem II blockers DCMU and DBMIB (both 10(-5) M) as well as by the autooxidizable photosystem I electron acceptor, paraquat (10(-3) M). Chlorophyll photobleaching is accompanied by the formation of thiobarbituric acid -- sensitive material ("malondialdehyde") and ethane. Both chlorophyll photobleaching and light dependent ethane formation are partially prevented by higher concentrations (10(-4) M) of the autooxidizable photosystem II electron acceptor DBMIB or by sodium bicarbonate (25 mM). In vitro studies with cell free extracts (homogenates) from E. gracilis suggest that alpha-linolenic acid oxidation by excited (reaction center II) chlorophyll represents the driving force for both ethane formation and chlorophyll bleaching. Ethane formation thus appears to be a sensitive and non-destructive "in vivo" marker for both restricted energy dissipation in photosystem II and, conditions yielding reactive oxygen species at the reducing side of photosystem I.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
