Abstract
Investigations were carried out to study the high light stress effects on photosystem (PS) II efficiency in intact leaves of four rice (Oryza sativa L.) cultivars, viz., Jyothi, Aiswarya, Swarnaprabha and Kanchana. Rice seedlings were exposed to high light stress of 2000 µmol m−2 s−1, and the photochemistry of the four rice cultivars was studied by analyzing chlorophyll-a (Chla) fluorescence at 0 (control), 2 and 8 h. The results showed that Fv/Fo, performance index, area above the flourescence curve, Φo/(1 − Φo), ΦDo, ΦEo, Vj and DIo/CSo were found to be more reliable for exploring the effect of changes in PSII activity after high light stress application for short term (2 h), which can aid in distinguishing the tolerant and sensitive rice cultivars. Some Chla fluorescence parameters (Fm, SFI, Fv/Fm, Ψo/(1 − Ψo), ETo/CSo, ABS/CSo) were modified only after exposing the plants to high light stress for 8 h. The order of high light stress tolerance of these cultivars according to the analysis of Chla fluorescence parameters was Jyothi > Aiswarya > Swarnaprabha > Kanchana.
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