Abstract
An effective anodic-stripping method for the simultaneous detection of trace metals is described. For this purpose a sensor array consisting of three thin-film noble-metal microelectrode arrays made in silicon technology is designed. The use of a home-made multipotentiostat allows parallel control of different potential-time regimes for each electrode array. The trace metal are preconcentrated on the amalgamized electrodes by applying the optimal potential for the respective metal. After the deposition period, for every electrode a small potential window, specifically selected for the deposited metal, is scanned using differential pulse voltammetry (dpv). Thus only one metal is detected on each electrode. This stripping regime ensures a short measuring time and simplifies the evaluation of the results. Furthermore, errors resulting from intermetallic interactions in the amalgam layer are reduced.
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