Chemistry enhanced shear thickening polishing of Ti–6Al–4V

Abstract

To obtain the great surface quality of Ti–6Al–4V and achieve high efficiency in the polishing process, the chemistry enhanced shear thickening polishing (C-STP) was proposed, and the polishing performance of different pH slurry was studied. The results show that the material removal rate gradually increases as the pH value decreases from 10 to 1, and the best surface quality is obtained at pH 2. The corrosion current density and potential were measured by potentiodynamic polarization under three typical pH values. It is confirmed that the most massive corrosion rate presents at pH 2, and the passive film is most susceptible to be produced at pH 10. The reaction resistance was measured by electrochemical impedance spectroscopy to clarify the polishing mechanism. Under acidic conditions, the chemical reaction product on the surface can be quickly removed by mechanical action of the abrasive. On the contrary, the passive film formed on the surface under the alkaline condition is difficult to be removed. The corrosion reaction products were determined by X-ray photoelectron, and the chemical reaction under acid-base environment was derived. MRR reached 107.3 nm/min under the selected process parameters, and the surface roughness (Sa) is reduced from 124 nm to 8.6 nm within 15 min.