Abstract
A radiotracer technique was used to study the adsorption of xenon in the presence of fluorine on nickel and palladium foils. Isotherms measured at temperatures of 243–373 °K showed that xenon was adsorbed. Examination of the surfaces by electron microscopy showed that the presence of xenon markedly influences the attack of fluorine on the metal. It is suggested that xenon is chemically bound to fluorine in the absorbed state, and that this constitutes the intermediate in the catalyic formation of xenon difluoride.
Published Version
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