Chemisorption of no on mo(110) surface studied by AES, UPS and XPS

Abstract

The chemisorption of nitric oxide on the Mo(110) surface at room temperature and low temperature has been studied by Auger electron spectroscopy (AES), ultra-violet photoelectron spectroscopy (UPS) and X-ray photoelectron spectroscopy (XPS). NO adsorbs dissociatively on the Mo(110) surface at lower coverage at room temperature, and a small amount of molecular NO exists on the fully NO-covered Mo(110) surface. NO adsorbs molecularly on the Mo(110) surface at low temperature (200 K), and dissociates up to 373 K. The UPS and XPS results show that nitrogen and oxygen atoms on the surface change the adsorption states at higher temperature. Molybdenum-nitride may be formed on the surface above 1023 K, and a peak caused by surface oxide appears above 1373 K.