Abstract
Abstract The underpotential deposition (UPD) of Cu on Pt was studied in acid media using cyclic voltammetry and rotating ring-disk electrode techniques. Experimental data at sub-monolayer levels demonstrate that ad-atom formation occurs in different energy states and no rearrangements take place in the ad-layer. Rotating ring-disk studies of the oxygen reduction reaction on Cu UPD show a strong inhibition of the reaction only in the region of diffusion control. At first, the 4 e reaction to H 2 O is inhibited in favor of the 2 e reaction to H 2 O 2 but at more negative potentials even the formation of H 2 O 2 is inhibited. A mechanism based on the degree of surface-active sites blocked by Cu ad-atoms is proposed.
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