Abstract
AbstractNanoscale solid solutions of Ir and Au over a wide compositional range and a layer thickness of 80 nm are obtained by electrochemical deposition using a 90 nm sputtered Au film on a Si wafer substrate as working electrode in an aqueous electrolyte containing IrCl3 (25 μM) and HAuCl4 (12.5 μM) at 323 K.
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