Abstract
[29] M. A. van Dijk, R. van den Berg, Macromolecules 1995, 28, 6773.[30] From the morphology of the polymer blend thin film, it was alreadypointed out that there is no clear affinity for one of the two hydropho-bic phases to preferentially wet the hydrophilic silicon substrate.[31] V. Z.-H.Chan,E. L. Thomas, R. G. H.Lammertink, M. A. Hempenius,G. J. Vancso, H. Wang,R. J. Composto, unpublished.[32] Auger electron spectroscopy (AES) data obtained for oxygen etchedPFS homopolymer are consistent with the XPS results. Depth profiling(argon ion sputtering) indicated an approximately 10 nm thin layerrich of iron, silicon, and oxide at the surface of the oxygen etchedpolymer film.[33] A. B. Fischer, J. B. Kinney, R. H. Staley, M. S. Wrighton, J. Am.Chem. Soc. 1979, 101, 6501.
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