Abstract
A variety of new 2, 6-dinitrobenzyl sulfonate esters were synthesized and evaluated in terms of thermal stability, quantum yield, and absorbance. The lithographic performance of these novel esters was evaluated in poly(4-(t-butyloxycarbonyloxy)styrene sulfone) copolymer. It was found that the lithographic sensitivity of these resist formulation was substantially better than those based on 2, 6- dinitrobenzyl tosylate and approaches that achieved with conventional onium salt based resists. In addition, they have the advantage of not containing metallic or ionic components.
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