Abstract
Chemically amplified resists based on methyl methacrylate ter-copolymers with methacrylic acid and isobornyl (met)acrylates, experiencing hydrolysis in the presence of photogenerated acid, responsible for pattern generation in resists, when they are exposed to the deep ultraviolet (254 nm), extreme ultraviolet (13.5 nm), and electron beam, are studied. The influence of the polymeric matrix, photoacid generator, and exposure conditions on quality of the chemically amplified image is evaluated.
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