Chemically amplified molecular resists based on noria derivatives containing adamantyl ester groups for electron beam lithography

Abstract

In this study, the authors examined the synthesis and resist performance of positive-tone chemically amplified molecular resist materials based on noria (water wheel in Latin) derivatives with pendant adamantyl ester (AD) groups (noria-AD) using an electron beam (EB) exposure tool. The physical properties of synthesized noria derivatives with various ratios of AD groups and their patterning properties were examined in an EB exposure tool. Furthermore, lithographic performances such as the etch durability and line width roughness of resist patterns were also investigated. These results showed that the physical properties and resist performance of the noria-AD were consistent with the ratio of AD groups, and noria derivatives have high potential to offer higher-resolution resist patterns for EB lithography.