Abstract
The atmospheric pressure chemical vapour deposition (APCVD) reaction of VCl4 or VOCl3 with cyclohexylphosphine at substrate temperatures of 600 °C deposits thin films of amorphous vanadium phosphide. The films are black–gold, hard, chemically resistant and conductive. The APCVD reaction of MCl5 (where M = Nb or Ta) with cyclohexylphosphine at 500–600 °C deposits films of crystalline β-MP and at 400 °C–450 °C amorphous films of stoichiometry MP are formed. The MP films are metallic, conductive, adherent and chemically resistant.
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