Abstract
Chemical vapor deposition (CVD) of iridium and rhodium coatings using hydridotetrakis(trifluorophosphine) complexes as the precursor is presented. These inorganic, volatile, carbon- and oxygen-free compounds undergo a decomposition reaction to form highly pure iridium and rhodium metallic films on molybdenum substrates in the CVD reactor at growth temperatures as low as 450°C. The dependences of the deposition process and characteristics of the iridium and rhodium coatings have been investigated.
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