Chemical structure and surface morphology evolution of glow discharge polymer films by Ar‐ions intermittent etching

Abstract

The Ar‐ions intermittent‐etching technique was successfully incorporated during the deposition of glow discharge polymer (GDP) films. The ionic components and ion energy distributions (IEDs) of C4H8/H2 and C4H8/H2/Ar plasma were diagnosed by an energy‐resolved mass spectrometer, respectively. The Fourier transform infrared spectroscopy, scanning electron microscope, and white‐light interferometer were used to studying the chemical structure, surface morphology, and roughness of the GDP films, which are deposited with the various time of Ar‐ions intermittent etching. With the introduction of Ar into the chamber, the intensity of the CH absorption peaks becomes weak and the large‐mass CH species were ionized and dissociated from the mass spectrometer results. The surface roughness of GDP films are decreased with Ar‐ions intermittent etching, the lowest surface roughness (Rq) is only 33.6 nm when the intermittent cycle is 60 minutes/15 minutes. The highest sp3CH3 (sym) absorption peaks are attributed to samples also with 60‐minute/15‐minute intermittent cycle, which shortens the length of the carbon chain and reduces the probability of the cluster formations.