Abstract
Chemical stabilities, especially corrosion characteristics for sputtered CoCr perpendicular recording media have been investigated. The corrosions were analyzed by XPS and by measuring electrical resistance increase (ΔR/R 0 ) for a CoCr film stripe pattern under exposure to 80°C and 85 % relative humidity. The corrosion rate strongly depended on the CoCr film preparation conditions. The correlation between ΔR/R 0 and test time t was expressed by the equation \DeltaR/R_{0} = \alpha \log (t + 1) , where α was a coefficient. In the regions of low sputtering pressure and high power, excellent corrosion resistances were obtained. These corrosion characteristics were attributed to the crystalline microstructures.
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