Chemical sputtering yields of titanium carbides

Abstract

Chemical sputtering yields of CVD and PVD TiC coatings and sintered TiC bulk have been measured at normal incidence for H + ions in the energy range between 0.1 and 6 keV and in a target temperature range between room temperature and 700° C. Temperature and sample dependences of the yields are small. The yields are one order of magnitude less than those of graphite and show a maximum at energies around 2 keV for the hydrogen ions. The strong dose dependence of the yields was measured and discussed in view of the surface concentration of carbon. The emphasis in the discussion is given to the importance of enhanced diffusion of carbon due to proton bombardment and of chemisorption of carbon impurities.