Chemical Solution Deposition of Al(OH)3‐AlOOH Films: Application for Surface Sensitizing of Rigid and Flexible Substrates to Improve the Adhesion in Coating Technology Areas

Abstract

AbstractIn this work, we present a simple and low cost formulation to obtain transparent Al(OH)3‐AlOOH thin films by chemical solution deposition at 60 °C. The deposited material was characterized by ultraviolet–visible spectroscopy, X‐ray photoelectron spectroscopy, and thermogravimetric analysis. The adhesion of the obtained thin films to various rigid and flexible substrates, that include tin‐free glass, polycarbonate, polymethyl methacrylate, cellulose acetate, polypropylene, polyethylene terephthalate, and polyimide, was tested. We also demonstrate here that a very thin film of Al(OH)3‐AlOOH can act as sensitizing layer for subsequent deposition of adherent and uniform CdS thin films on a variety of substrates; therefore, a modification of the reaction conditions by an increase in cadmium salt or a decrease in reaction temperature, which are factors that promote adhesion, is then not necessary. As a further result, a general formulation to deposit films of metal hydroxides/oxyhydroxides/oxides is presented. In addition, realistic assessments of X‐ray photoelectron spectroscopy and thermogravimetric analysis on Al(OH)3, AlOOH, and Al2O3 compounds are presented for the first time.