Chemical reactions and interdiffusion at the Fe/NiO(0 0 1) interface

Abstract

The interaction between Fe and NiO(0 0 1) surface for increasing metal deposition at RT was studied by means of X-ray photoelectron spectroscopy and X-ray photoelectron diffraction. NiO reduces to an extent that depends on the amount of deposited Fe, up to a maximum of 1 ML for Fe deposition of 5 ML or larger. The overlayer initially grows in a 3D island mode, with partial intermixing between the deposited Fe atoms and the metallic Ni atoms resulting from the reduction process. The intermixed region extends up to about 3 ML. For 5 ML Fe deposition, the islands coalesce into a continuous film.