Chemical HF laser with pulsed inductive discharge initiation

Abstract

For the first time, we have used a pulsed inductive discharge to initiate a chemical HF laser. This publication presents research into selection of an active medium for such a laser, as well as the composition of the gas mixture. For the mixture of H2–SF6 we have managed to obtain lasing in the infrared spectrum around 2.7 μm. Addition of buffer gases such as either He or Ne, or both of them, has resulted in increased lasing energy. Experiments have been performed to study the timing and output performance characteristics of the chemical HF laser at different pressure and pumping levels. For the mixture with Ne at a pressure of 45 Torr, the energy obtained was 10 mJ, and the peak pulse power −5 kW. The pulse duration (FWHM) was 2 μs.