Abstract
Abstract CuS thin films were deposited on glass surfaces modified by treatment with 3-mercaptopropyltrimeth-oxysilane from a chemical bath made up of copper ions, sodium citrate and thioacetamide. The present method combines the advantage of using a non-ammoniacal aqueous bath for the deposition of these films with that of a surface treatment which inhibits the detachment of the film from the glass substrate when films grow thicker. Single depositions for durations of about 2–8 h at 25°C yield films of thicknesses in the range of 0.13–0.25 μm. Multiple depositions for a total period of 20 h result in a film thickness of 1 μm. X-ray photoelectron spectra of the films indicate the molar composition of CuS and X-ray diffraction pattern confirms the covellite structure for the thin films. Results regarding the thermal stability, optical transmittance spectra and electrical properties of the films are presented.
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