Abstract
The term chemical deposition of metals and/or alloys from aqueous solutions is usually used to refer to the production of metallic coatings or powders of various surface morphology and properties without an application of the external current source. As explained in previous chapters in the electrochemical deposition, electrons used for the reduction of metal ions are provided by an external current source. For the chemical deposition, electrons used for the reduction of metal ions are released under specific conditions from an appropriate reducing agent. These appropriate reducing agent may include compounds such as hypophosphite (NaH2PO2), borohydride (NaBH4), formaldehyde (HCOH), ascorbic acid (C6H8O6), etc., or metals which are less noble than the metal aimed to be deposited. These concepts of chemical deposition will be examined in details in the following text.
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