Abstract
A mathematical model for a continuous chemical vapor deposition (CVD) reactor is proposed. The simplest kinetics of chemical reactions and phase transitions in the bulk gas mixture and at the surface of the finely dispersed solid phase is used to study the interaction between micro-and macroscale phenomena. A quasi-steady microscale problem is solved analytically. A self-consistent numerical solution of the micro-and macroscale problems is used to obtain the fields of concentrations, temperature, distributions of fractions of the finely dispersed solid phase, and other parameters for different values of dimensionless numbers. The proposed model can be used to evaluate the phase structure, particle growth or evaporation kinetics, and the deposition rate of the solid phase.
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