Chemical composition and acid-base properties of the surface of GaAs-CdS solid solutions

Abstract

Chemical composition and acid-base properties of the surfaces of GaAs-CdS solid solutions and the constituent binary compounds exposed to air, vacuum, CO, and NH3 were analyzed using mass spectrometry, IR spectrometry, isoelectric-point pH (pHiso) analysis, and mechanochemical methods. Powders and films were prepared from the solid solutions by isothermal diffusion and discrete vacuum evaporation, respectively. XRD and Raman analysis revealed that a solid solution has a sphalerite or wurtzite structure, depending on its composition. The initial surface of all the systems studied exhibited acidic properties: the pH value ranged from 4.9 to 6.45. The surfaces contained Lewis (electron accepting) and Bronsted (adsorbed H2O and CO2 molecules, OH− groups) sites. The acidity of the surface increased upon treatment with CO and decreased upon treatment with NH3. For all types of treatment, the concentration dependence of the acid-base properties of the surface exhibited an extremum. The strongest acidic sites were revealed on the surface of the (GaAs)0.95 (CdS)0.05 solid solution. The adsorption activity of this solution, a promising material for manufacturing gas sensors, was evaluated.