Abstract
Scanning probe microscope-induced local oxidation of a material surface with adsorbed water is a recent nanolithographic technology. We applied this technique to the nanoscale patterning of hydrogen-terminated silicon (Si-H) surfaces. Using the silicon oxide (SiOx) patterns as masking, examples of two types of pattern transfer method through area-selective chemical modification were demonstrated. Nanostructures of substrate Si or deposited gold were fabricated by wet chemical etching or electroless plating, respectively. These area selectivities arose from the difference in surface chemical reactivities between anodic SiOx and the surrounding Si-H. The oxidation chemistry is discussed in terms of anodization.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
