Abstract
In the present work, TiO2 thin films were deposited on quartz substrate by ion beam sputtering method at varying oxygen partial pressure. The film deposition on the substrate was confirmed by x-ray photoelectron spectroscopy technique. From the results of closed aperture z-scan performed using He-Ne laser, the value of non-linear refractive indices were found decreasing with increase in partial pressure. Thermo-optic coefficient also decreased with increase in oxygen partial pressure, operated during the process of deposition.
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