Chemical Activity and Morphology of Nanostructured Plasma-Sprayed Titanium Induced by Nitrogen and Argon Ions

I V Perinskaya ,V V Perinsky ,Svetlana Kalganova

doi:10.1051/e3sconf/202128801037

I V Perinskaya , V V Perinsky + Show 1 more

Open Access

https://doi.org/10.1051/e3sconf/202128801037

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Abstract

The paper focuses on the chemical characteristics of ion-beam passivation effects (of the first-third order) of titanium depending on the dose of implanted ions. The key objective is electron microscopy and SPM-based analysis of nanostructured VT1-00 titanium surfaces produced by entering nitrogen and argon ions of high energy. This type of surfaces can find application in fabrication of devices for the power engineering industry. The obtained experimental data provide evidence of a carbon nanocoating over the surface of titanium implanted with accelerated nitrogen ions, which is similar to that acquired upon titanium implantation with argon ions. A hypothesis is formulated about the existence of a mechanism for changing the chemical activity of titanium as a result of ion-beam nanostructuring – ion-stimulated synthesis of.

Highlights

In recent years, ion implantation, i.e. the process where ions are accelerated into solid bodies, has acquired prime importance in designing microelectronic devices for modern solid-state electronics, and in creating a universal methodology for experimental solidstate physics and materials science, which can be applied in fabrication and research of nanomaterials
This research is devoted to the study of the VT1-00 nanostructured titanium, induced by the nitrogen and argon ions, which is required in manufacturing power engineering devices
Part of the test models underwent ion-beam treatment by nitrogen ions (N+), a second part was treated by argon ions (Ar+), with the ion dose at the accelerating voltage amplitude about 75 keV

Summary

Introduction

Ion implantation, i.e. the process where ions are accelerated into solid bodies, has acquired prime importance in designing microelectronic devices for modern solid-state electronics, and in creating a universal methodology for experimental solidstate physics and materials science, which can be applied in fabrication and research of nanomaterials. Studies of the effects of ion implantation into metals are conducted across many lines, starting from simulation of neutron, proton, and helium defects in the walls of nuclear reactors to the challenges concerned with improving corrosion resistance of copper layers in microwave ICs [1,2,3,4]. This research is devoted to the study of the VT1-00 nanostructured titanium, induced by the nitrogen and argon ions, which is required in manufacturing power engineering devices

Experimental methods

Conclusions