Abstract
Methods to suppress charge build-up during ion implantation in glass and the charging effect of ion implantation on glass have been investigated. The methods to suppress charge build-up, such as use of an electron flood gun or metal film coating, and electron generation from ion-irradiated metal, are effective and sufficient in the present experiment. Positive charge accumulates on the glass surface without these charge neutralization methods. A decrease in the projected range of implanted ions and in actual ion dose, and inhomogeneous planar distribution due to the charging have become evident. Strong visible light emission and broadening of the light-emitted area due to the charging are also observed during the ion implantation.
Sign-in/Register to access full text options 
Free) 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a call
