Abstract
Abstract Radioactivation methods in general are essential for trace analysis because of their accuracy; among these methods, charged particle activation analysis (CPAA) is especially suitable for the determination of light elements such as boron, carbon, nitrogen, and oxygen at trace levels in materials. CPAA can also be used advantageously for other heavier elements if needed, and sometimes be a complement to neutron activation analysis, or even competes with it. The CPAA is the best reference method because of its high sensitivity and selectivity. It permits the determination of the total concentration, regardless of chemical state. The surface contamination can be eliminated by etching after irradiation and absolute concentrations can be obtained by direct comparison with known compounds. There are no matrix effects and no need for reference samples. This article describes and discusses, in more detail, the principle and some applications of CPAA. Examples are given of typical applications of CPAA technique such as the study the oxygen profiling in Czochralski‐silicon (Cz‐Si) substrates submitted to a rapid thermal annealing, and the study of the oxygen behavior in thermally treated Cz‐Si substrates by combining CPAA with ion channeling.
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