Abstract
The present work demonstrates selective charging of metal nanoparticles on semiconductor substrates, exploiting the Fermi level difference. Monolayers of surfactant-free silver nanoparticles (AgNP) were prepared by electroless reduction as well as vapor deposition on high conductivity n- and p-type Si substrates. The selective charging of the AgNP was investigated using electric force microscopy (EFM). As deduced from EFM, polarity and magnitude of the nanoparticle charge can be controlled by varying the Fermi level difference. The present study also reveals the impact of charging on the growth and coalescence of AgNP during chemical reduction. We also demonstrate that the monolayers of charged AgNP can be employed as charge-selective Raman scattering (i.e., surface-enhanced Raman scattering) substrates.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
