Charge trapping characteristics of Al 2O 3/Al-rich Al 2O 3/SiO 2 stacked films fabricated by radio-frequency magnetron co-sputtering

Abstract

A thin-film structure comprising Al 2O 3/Al-rich Al 2O 3/SiO 2 was fabricated on Si substrate. We used radio-frequency magnetron co-sputtering with Al metal plates set on an Al 2O 3 target to fabricate the Al-rich Al 2O 3 thin film, which is used as a charge storage layer for nonvolatile Al 2O 3 memory. We investigated the charge trapping characteristics of the film. When the applied voltage between the gate and the substrate is increased, the hysteresis window of capacitance–voltage (C–V) characteristics becomes larger, which is caused by the charge trapping in the film. For a fabricated Al–O capacitor structure, we clarified experimentally that the maximum capacitance in the C–V hysteresis agrees well with the series capacitance of insulators and that the minimum capacitance agrees well with the series capacitance of the semiconductor depletion layer and stacked insulator. When the Al content in the Al-rich Al 2O 3 is increased, a large charge trap density is obtained. When the Al content in the Al–O is changed from 40 to 58%, the charge trap density increases from 0 to 18 × 10 18 cm − 3 , which is 2.6 times larger than that of the trap memory using SiN as the charge storage layer. The device structure would be promising for low-cost nonvolatile memory.