Charge pumping electrically detected magnetic resonance of silicon carbide power transistors

Abstract

Silicon carbide (SiC) power devices are becoming central components in high voltage electronics. However, defects at interfaces and in the bulk continue to severely impact their reliability and performance. Here, we develop a charge pumping method to characterize SiC/SiO2 interface defects in fully fabricated commercial SiC power metal–oxide–semiconductor field-effect transistors (MOSFETs). The method is then used to address spin states at the SiC/SiO2 interface via charge pumping electrically detected magnetic resonance (CP-EDMR). We apply these methods to investigate the power MOSFET after electron irradiation over a dose range of 1013−1017 cm−2. We finally discuss CP-EDMR as a technique to interrogate spins during device operation for real-time monitoring of the device quality, performance, and degradation and as a probe for local magnetic fields.