Abstract

The charge pattern produced by atomic force microscopy on an insulating surface can be detected on the nanoscale using Kelvin probe force microscopy. Recent applications of charge patterns include data storage, nano-xerography, and charge writing. At present, ongoing development of this technology is being restricted by a poor understanding of the charge modification and erasure mechanisms. In this study, modification and erasure of charge patterns are achieved by applying oppositely polarized pulses to an insulating surface. The effects of the oppositely polarized pulse height and width on the charge erasure behavior are examined, and the charge injection and erasure processes are compared. Hence, it is demonstrated that the charges on the patterned surface can be neutralized by adjusting the height and width of the oppositely polarized pulse appropriately. In addition, charge injection and erasure mechanisms are proposed. It is suggested that application of an oppositely polarized pulse to the insulating surface causes injection of opposite charges into the surface and removal of the initial charges, both of which occur simultaneously. The findings of this work provide a means of achieving data re-storage or data modification, for which charge spot erasure is essential. In addition, the findings may have general implications for the development of nano-xerography, charge writing, nano-lithography, etc.

Highlights

  • Charge injection technology has been used in data storage,[1,2] nano-xerography,[3] charge writing,[4] etc

  • It was demonstrated that a charge pattern on an insulating surface can be neutralized by adjusting both the height and width of an oppositely polarized pulse applied after the pattern formation

  • It is suggested that the potential barrier formed by the surface atoms plays an important role in the charge injection and erasure processes

Read more

Summary

Introduction

Charge injection technology has been used in data storage,[1,2] nano-xerography,[3] charge writing,[4] etc To develop this technology and its various applications, the majority of investigators have focused on investigating the charge injection process.[5,6,7,8,9,10] In this process, a charge can be injected into an insulating surface through application of a pulsed bias between the conductive tip of an atomic force microscope (AFM) and the insulating surface when they are in contact. It may be possible to prevent charge accumulation and disruptive discharge in microelectronics, which can damage these devices, by erasing the surface charge in a timely manner.[13,14]

Methods
Results
Discussion
Conclusion
Full Text
Published version (Free)

Talk to us

Join us for a 30 min session where you can share your feedback and ask us any queries you have

Schedule a call