Abstract
Complementary doped donor and acceptor dipoles effectively generate confinement potentials for carriers across a p-type/intrinsic/n-type coaxial nanowire due to the lineup of charge neutrality level. In order to verify this physical picture, we employ first-principles density functional theory to study the confinement of electrons and holes in complementary boron (p-type) and phosphorus (n-type) doped coaxial silicon nanowires. An analysis of the charge density distributions reveals that the electrons and holes are spatially separated in core and outer shell regions, respectively, in conformity with a type-II lineup of band structures.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Disclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.