Abstract
AbstractVariable Angle Spectroscopic Ellipsometry (VASE®) is a common characterization method for thin films used in the flat panel display industry. It is a precise and non‐destructive technique for determining refractive index and film thickness for single or multi‐layered films. The film properties can be mapped to ensure uniformity over large area panels. The application of VASE® for flat panel applications will be reviewed — including measurements of amorphous silicon, silicon nitride, silicon dioxide, liquid crystals, indium tin oxide (ITO), and multi‐layers of these materials.
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