Characterizing dark mantle deposits in the lunar crater Alphonsus

Abstract

We analyze available remote-sensing data of the crater Alphonsus, focusing on the analysis of the crater's dark mantle deposits (DMDs), which includes images from NASA Clementine and Lunar Reconnaissance Orbiter (LRO), Japanese Selene (Kaguya), and Indian Chandrayaan-1 missions. The Alphonsus DMDs are gentle-sloped flat hills with typical heights of several meters, which are presented with pyroclastic materials. Our determination of the absolute ages of the Alphonsus DMDs by the technique of crater size-frequency distributions shows that they are ∼200–400 m.y. old. However, being geologically young, the Alphonsus DMDs are not seen in OMAT maps. The DMDs have noticeably lower content of TiO2 (2–3%) than the mare regions to the west (>4%). The assessment of total pyroxene shows it has a higher abundance in the DMDs, although LRO Diviner measurements of the Chirstiansen feature suggest, rather, a high abundance of olivine. The DMDs pyroclastic material has no signs of OH/H2O compounds. We may suggest that this characteristic of the DMDs either relates to their impact reworking and loss of the OH/H2O compounds or to the non-water volatiles as the driving agent of the pyroclastic activity. The compositional assessments of the DMDs may be flawed from contamination with the surrounding material due to horizontal and vertical transportation due to impacts. This effect probably can be observed in LROC NAC images of high resolution. A very dark material outcropping on the slopes of the vent depression is seen due to renovation of the regolith on the steep walls of the depression. Thus, at smaller phase angles, the pyroclastic material is dark and at larger phase angles it appears almost like the surrounding material. This means that the phase dependence of the outcropping dark material is shallow; i.e. the dark surface is smoother than its surroundings. This may suggest venting of gases resulting in fluidization of the granular pyroclastic material of the deposit.