Abstract
We prove characterizations of dual multiwavelet frames for [Formula: see text] constructed from a pair of [Formula: see text]-periodic multirefinable generators. Based on the notion of the Mixed Fundamental sequence we derive Mixed Extension Principles dictating the construction of dual wavelet masks with respect to given refinement masks and we show that these Principles characterize dual framelets.
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More From: International Journal of Wavelets, Multiresolution and Information Processing
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