Abstract
Thin films of CN x deposited by physical vapor deposition (PVD) with different contents of nitrogen have been studied. An RF-powered antenna was added to a classical magnetron sputtering system. The addition of an antenna plays an important role in mechanical and physicochemical properties. The films have been characterized using XPS, AFM, Brillouin light scattering, grazing angle FTIR, and wettability test. The results show in particular that the Rayleigh wave velocity determined by BLS increased when deposit is assisted by the antenna. Refractive index and surface tension are also enhanced with the use of an antenna. Moreover, high deposition rates are obtain with antenna without modification of N/C ratio.
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