Abstract
Transparent conducting ZnO: Al thin films with good adhesion and low resistivity have been prepared on organic substrates and Corning 7059 glass substrates by r.f. magnetron-sputtering technique at low substrate temperature (25–210°C). Structural and photoelectric properties of the deposited films are investigated. The deposited films are polycrystalline with hexagonal structure and a preferred orientation with the c-axis perpendicular to the substrate. Only the (002) peak is observed. High quality films with resistivity as low as 1.0 x 10-3Ω·cm and 8.4 x 10-4Ω·cm, the average transmittance over 74% and 85% in the wavelength range of the visible spectrum have been obtained on different substrates.
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