Abstract
The pyrolysis of Langmuir-Blodgett (LB) films of kapton-type polyamic acid N, N-dimethyloctadecylamine salt (PAO) has been studied to prepare ultra-thin carbon films. The deposition of PAO monolayers onto silicon-wafer substrate has been found to be performed well at 10°C under 35 mN/m. The structures of PAO 51 layered LB film and the heat-treated ones have been characterized by X-ray photoelectron spectroscopy (XPS) and atomic force microscopy (AFM). XPS spectra indicate that the evolution of nitrogen starts at 600°C or lower and that the ultrathin carbon film is formed on the silicon-wafer substrate by the treatment at 1000°C. AFM results of heat-treated PAO LB films show that (1) the surface has many holes at 360°C, (2) island like structure is formed after heating up to 500 and 600°C, (3) the smoothness of the film surface increases with increasing the heat-treatment temperature, and (4) the carbon film with about 4nm thickness can be prepared by heating up to 1000°C.
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