Characterization of TiZrN and TaZrN Nanocomposite Multilayer Coating Deposited via RF/DC Magnetron Sputtering on AISI4140 Steel

R Hariharan,S Ravi,Mohamad Reda A Refaai,R Raja,R J Golden Renjith Nimal,Haiter Lenin Allasi,P Ganeshan

doi:10.1155/2021/8273708

Abstract

In this present research work, TiZrN and TaZrN multilayer coating was deposited on 4140 steel by RF/DC magnetron sputtering for comparative work also prepared in single layer. The flow rate ratio of Ar/N2 was set to 15 : 3 sccm and the thin film was prepared by the PVD (physical vapor deposition) method by RF/DC magnetron using a Ti-Zr and Ta-Zr target with a purity of 99.99%. The crystal structure, surface morphology microstructure, and component arrangements were explored by X-ray diffraction (XRD), scanning electron microscope (SEM), and atomic force microscopy (AFM). It has been found that the crystal structure, surface morphology, microstructure, and elemental composition of the membrane are strongly dependent on deposition parameters. It is mechanically characterized by corrosion and Vickers hardness. In AFM measurements, coarse cluster particles with increasing Ti and Ta values not only increase the average roughness (Ra) by 2.341 nm (200°C) and 2.951 nm (400°C) but also have a continuous average thickness which was shown to increase by 1.504 nm and 781.75 nm. With the increase of hardness, the roughness decreases correspondingly. The TiZrN multilayer microhardness augmented to 314 GPa at 200°C and 371 GPa for TaZrN (400°C).

Highlights

In this present research work, TiZrN and TaZrN multilayer coating was deposited on 4140 steel by RF/DC magnetron sputtering for comparative work prepared in single layer. e flow rate ratio of Ar/N2 was set to 15 : 3 sccm and the thin film was prepared by the PVD method by RF/DC magnetron using a Ti-Zr and Ta-Zr target with a purity of 99.99%. e crystal structure, surface morphology microstructure, and component arrangements were explored by X-ray diffraction (XRD), scanning electron microscope (SEM), and atomic force microscopy (AFM)
In order to accumulate the benefits of both oxide layers simultaneously in one device, we propose interface engineering that supports the chemical composition and physical structure of the titanium-doped zirconium oxide (ZrTiO2) layer
The XRD intensity of level (101), (220), and (222) increased but decreased for level (200) [7]. e intensity of the plane (200) changed significantly, indicating a preferred orientation with maximum intensity. e development of the crystal structure is attributed to the additional energy of the deposition atoms on the substrate surface during the formation of the membrane, which leads to greater mobility of the Ad atom and to greater crystalline of the membranes due to longer deposition time (60 minutes)

Summary

Introduction

In this present research work, TiZrN and TaZrN multilayer coating was deposited on 4140 steel by RF/DC magnetron sputtering for comparative work prepared in single layer. e flow rate ratio of Ar/N2 was set to 15 : 3 sccm and the thin film was prepared by the PVD (physical vapor deposition) method by RF/DC magnetron using a Ti-Zr and Ta-Zr target with a purity of 99.99%. e crystal structure, surface morphology microstructure, and component arrangements were explored by X-ray diffraction (XRD), scanning electron microscope (SEM), and atomic force microscopy (AFM). In this present research work, TiZrN and TaZrN multilayer coating was deposited on 4140 steel by RF/DC magnetron sputtering for comparative work prepared in single layer. It has been found that the crystal structure, surface morphology, microstructure, and elemental composition of the membrane are strongly dependent on deposition parameters. It is mechanically characterized by corrosion and Vickers hardness. E aim of this work was the deposition of nano structured thin TiZrN layers on unheated substrates without polarization of the substrate at different Ti sputtering currents with simultaneous asymmetrical DC magnetron sputtering [1,2,3]. Zr-doped TiO2 thin films can be prepared by plasmaassisted pulsed laser deposited and atomic layer deposition, electron beam evaporation, DC magnetron sputtering, RF magnetron sputtering, and chemical deposition methods, namely, chemical bath deposition, chemical spray pyrolysis method, and sol-gel spin coating method

Methods

Results

Conclusion