Abstract
Titanium dioxide and silicon dioxide multilayer stacks with typical thicknesses of a few nanometers have been evaporated by two electron beam guns. The high resolution transmission electron microscopy (HRTEM) and electron energy loss spectroscopy (EELS) techniques were used to characterized the microstructure and chemical composition of these multilayer stacks. The HRTEM images show that the SiO2 layers are amorphous as expected, while the TiO2 layers present traces of crystallinity even for small thicknesses. The EELS analysis of the recorded Si L23, O K and Ti L23 edges reveals that the O K edge in TiO2 exhibits a prepeak due to the presence of unoccupied O 2p-Ti 3d hybridized states, which constitutes another clear identification of the TiO2 layers.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
